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Wafer Surface Charge Reversal as a Method of Simplifying Nanosphere Lithography for Reactive Ion Etch Texturing of Solar Cells
Simplifying Nanosphere Lithography Solar Cells
2008/10/30
A simplified nanosphere lithography process has been developed which allows fast and low-waste maskings of Si surfaces for subsequent reactive ion etching (RIE) texturing. Initially, a positive surfac...
Designing for beam propagation in periodic and nonperiodic photonic nanostructures: Extended Hamiltonian method
beam propagation nonperiodic photonic nanostructures Extended Hamiltonian method
2015/8/11
We use Hamiltonian optics to design and analyze beam propagation in two-dimensional (2D) periodic structures with slowly varying nonuniformities. We extend a conventional Hamiltonian method, adding eq...