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Reduced basis method for source mask optimization
Reduced basis method source mask optimization
2010/11/16
Image modeling and simulation are critical to extending the limits of leading edge lithography technologies used for IC making. Simultaneous source mask optimization (SMO) has become an important obj...
Reduced basis method for computational lithography
Reduced basis method computational lithography
2010/11/16
A bottleneck for computational lithography and optical metrology are long computational times for near field simulations. For design, optimization, and inverse scatterometry usually the same basic la...