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Development of Extreme-Ultraviolet Light Source by Laser-Produced Plasma
Laser produced plasma Extreme Ultraviolet (EUV) Tin opacity
2009/6/1
Extreme ultraviolet (EUV) radiation from laser-produced plasma has been studied for mass-production of the next generation semiconductor devices with EUV lithography. A full set of experimental databa...
Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System
Substrate Effect Plasma Clean Efficiency Plasma Chemical Vapor Deposition System
2010/12/6
The plasma clean in a plasma-enhanced chemical vapor deposition (PECVD) system plays an important role to ensure the same chamber condition after numerous film depositions. The periodic and applicable...
Open-Circuit End Effect of Microstrip Line Configuration in Plasma Medium
Open-Circuit End Microstrip Line Configuration Plasma Medium
2010/12/10
The extension in length for open microstrip configuration in plasma media is determined using spectral domain technique under quasi static approach [1, 2]. The results were verified by modifying Hamme...
An Experimental Study of Curved Rectangular Microstrip Antenna in Simulated Plasma Medium
Curved Rectangular Microstrip Antenna Plasma Medium
2010/12/13
The effect of plasma on the radiation characteristics of curved rectangular microstrip antenna is studied by means of a new plasma simulation technique. Unlike previous techniques [1,2], a relative in...
Vector Kirchhoff Analysis for The Study of Rectangular Microstrip Antennas Immersed in a Plasma
Vector Kirchhoff Analysis Rectangular Microstrip Antennas a Plasma
2010/12/15
The radiation properties of a microstrip antenna immersed in an ionized medium have since been studied using potential function technique and linearized hydrodynamic theory. In the present paper, Vect...
This paper is devoted to the analysis of the Plasma-Optical Effect in GaAs PIN photodiodes operating at the infrared range. An approximated expression for the variation of the refractive index in the ...
Ceramic on Metal Substrates Produced by Plasma Spraying for Thick Film Technology
Ceramic Metal Substrates Plasma Thick Film Technology
2010/12/27
The arc plasma spraying process was applied to obtain ceramic coatings on stainless steel substrates. The outer coatings were formed from pure alumina or alumina + 2 wt. % titania mixture. The nichrom...