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预氮化+熔覆复合处理制备微纳尺度TiN增强复合涂层
钛合金 激光熔覆 预氮化 Ti-N复合涂层
2016/8/17
采用预氮化+脉冲激光熔覆复合工艺在TC4钛合金表面成功地制备出了具有微纳尺度TiN增强的Ti-N复合涂层，并与传统激光氮化涂层对比研究了该涂层的组织特征和力学性能。结果表明，所获预氮化复合涂层由TiN相和α'马氏体组成，涂层硬度随引入的固态氮源N含量的增加逐渐增大。对比分析表明，该复合工艺所获涂层的硬度性能与传统激光气体氮化样品基本相当，而在深度方向上其强化效果的维持性更好，并基于数据拟合初步提出...
Low Reflectivity and High Flexibility of Tin-Doped Indium Oxide Nanofiber Transparent Electrodes
Low Refl ectivity High Flexibility Tin-Doped Indium Oxide Nanofi ber Transparent Electrodes
2015/8/10
Tin-doped indium oxide (ITO) has found widespread use in solar cells, displays, and touch screens as a transparent electrode; however, two major problems with ITO remain: high reflectivity (up t...
Deposited indium-tin-oxide (ITO) transparent conductive films by reactive low-voltage ion plating (RLVIP) technique
ITO film RLVIP Optical transmittance Infrared reflectance Sheet resistance
2011/12/7
Indian-tin-oxide ITO transparent conductive films were deposited by the Reactive low-voltage ion plating (RLVIP) technique. CO2 and O2 gases were used as reactive gases coming into the vacuum. The eff...
脉冲偏压电弧离子镀低温沉积TiN硬质薄膜的力学性能
2007/7/28
期刊信息
篇名
脉冲偏压电弧离子镀低温沉积TiN硬质薄膜的力学性能
语种
中文
撰写或编译
作者
黄美东,孙超,林国强,董闯,闻立时
第一作者单位
刊物名称
金属学报
页面
2003年5月，第39卷第5期P516~520
出版日期
2003年
5月
日
文章标识(ISSN)
相关项目
电孤离子镀（Ti,M〕N硬质薄膜与硬质梯度薄膜研究
The effect of the ion beam energy on the properties of indium tin oxide thin films prepared by ion beam assisted deposition
ITO Thin film Polycarbonate Ion beam assisted deposition
2011/12/19
Indium tin oxide (ITO) thin films have been deposited onto polycarbonate substrates by ion beam assisted deposition technique at room temperature. The structural, optical and electrical properties of ...