搜索结果: 1-10 共查到“工学 mirrors”相关记录10条 . 查询时间(0.093 秒)
EXPLOITING MIRRORS IN 3D RECONSTRUCTION OF SMALL ARTEFACTS
Mirrors Range-based modelling Image-based modelling small artefacts
2018/6/4
3D reconstruction of small artefacts is very significant in order to capture the details of the whole object irrespective of the documentation method which is used (Ranged Based or Image Based). Somet...
POSE ESTIMATION AND MAPPING USING CATADIOPTRIC CAMERAS WITH SPHERICAL MIRRORS
Close Range Photogrammetry Catadioptric cameras Pose estimation Spherical mirrors
2016/7/27
Catadioptric cameras have the advantage of broadening the field of view and revealing otherwise occluded object parts. However, they differ geometrically from standard central perspective cameras beca...
From x-ray telescopes to neutron scattering: using axisymmetric mirrors to focus a neutron beam
atom and neutron optics x-ray optics Instrumentation and Detectors
2012/4/24
We demonstrate neutron beam focusing by axisymmetric mirror systems based on a pair of mirrors consisting of a confocal ellipsoid and hyperboloid. Such a system, known as a Wolter mirror configuration...
40-to-640-Gbit/s Multiplexing and Subsequent 640-to-10- Gbit/s Demultiplexing Using Cascaded Nonlinear Optical Loop Mirrors
Fiber optics communications Ultrafast nonlinear optics
2015/5/25
We experimentally demonstrate optical multiplexing of 40-Gbit/s channels at different wavelengths onto a single 640-Gbit/s channel and subsequent 640-to-10-Gbit/s demultiplexing using cascaded nonline...
Michelson Interferometer With Faraday Mirrors Employed In A Delayed Self-Heterodyne Interferometer
Coherent optical effects Heterodyne Interferometry
2015/5/25
Faraday rotator mirrors in a Michelson interferometer configuration is shown to significantly improve resolution and coherence for delayed self-heterodyne interferometery.Coherence is clearly observed...
Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target
laser-produced plasma extreme ultraviolet (EUV) source
2011/5/3
In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The ...
We present a method for open-loop control of a continuous face sheet MEMS deformable mirror of a type that is being developed by a number of MEMS manufacturers. In this type of DM, the continuous face...
Thermoreflectance study of temperature distribution on the semiconductor laser mirrors
thermoreflectance semiconductor laser mirrors temperature maps
2011/4/27
In the high-power semiconductor lasers, the surface of the mirror is the key element of the construction, which has the main impact on the reliability and degradation processes. In the case of lasers ...
Integration of High-Power Semiconductor Lasers Using Dry-Etched Mirrors
High-Power Semiconductor Lasers Dry-Etched Mirrors
2010/7/15
Broad-area InGaAs-AlGaAs laser diodes emitting at a wavelength of 980 nm with dry-etched mirror facets are presented. The devices exhibit optical output powers up to 1.5W per facet at room temperature...